BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
![PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/56b1bb76acd51804dcf35a31d1cbcb20934471f3/3-Figure1-1.png "PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar")
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
Spin on Hard-Mask Material - diagram, schematic, and image 08
NIL_vs_NEP-768x604.png
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching
Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Hard Mask Fabrication (HMF) - NanoSearcher
Microwaves101 | Photolithography 101
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Semiconductor Process Materials|Semiconductor material: etc
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Si Hardmask (Si-HM), EUV And Zero Defects
Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
Amorphous Carbon Hard Mask for Multiple Patterning Lithography | Semantic Scholar
